All Facilities Open for Users

TFS Helios G4 UX DualBeam FIB

TFS Helios G4 UX DualBeam FIB
  • Elstar electron column with the next-generation UC+ technology enables high resolution secondary and backscattered imaging even at low voltages
  • Advanced Phoenix Ion Column with Fast Beam Blanker
  • High resolution milling not only at high voltages, but even down to low voltages critical for production of high-quality lamella with minimal damage layers for TEM
  • Beam currents extend three times higher than previously available
  • Sample stage is a 150 x 150 mm eucentric piezo stage with an in-chamber Nav-Cam for accurate positioning of samples
  • EasyLift EX NanoManipulator enables fully or semi-automated TEM sample preparation, significantly reducing the time required to produce specimens.

Sample Publications Using this Instrument

L. Caretta, Y.-T. Shao, J. Yu, A.B. Mei, B.F. Grosso, C. Dai, P. Behera, D. Lee, M. McCarter, E. Parsonnet, Harikrishnan K.P., F. Xue, X. Guo, E.S. Barnard, S. Ganschow, Z. Hong, A. Raja, L.W. Martin, L.-Q. Chen, M. Fiebig, K. Lai, N.A. Spaldin, D.A. Muller, D.G. Schlom, and R. Ramesh, "Non-Volatile Electric-Field Control of Inversion Symmetry," Nat. Mater. 22, 207–215 (2023) and Highlight #67