Metal-organic chemical vapor deposition (MOCVD) 1 Used for the growth of single-monolayer-thick MoS2 and MoSe2 films on wafers up to 3” in diameter
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Metal-organic chemical vapor deposition (MOCVD) 1
National Science Foundation (Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM)) under Cooperative Agreement No. DMR-2039380.
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